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Cottat M, Lidgi-Guigui N, Tijunelyte I, et al. Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection. Nanoscale Res Lett. 2014;9(1):2361doi: 10.1186/1556-276X-9-623.
Cottat, M., Lidgi-Guigui, N., Tijunelyte, I., Barbillon, G., Hamouda, F., Gogol, P., Aassime, A., Lourtioz, J. M., Bartenlian, B., & de la Chapelle, M. L. (2014). Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection. Nanoscale research letters, 9(1), 2361. https://doi.org/10.1186/1556-276X-9-623
Cottat, Maximilien, et al. "Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection." Nanoscale research letters vol. 9,1 (2014): 2361. doi: https://doi.org/10.1186/1556-276X-9-623
Cottat M, Lidgi-Guigui N, Tijunelyte I, Barbillon G, Hamouda F, Gogol P, Aassime A, Lourtioz JM, Bartenlian B, de la Chapelle ML. Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection. Nanoscale Res Lett. 2014 Dec;9(1):2361. doi: 10.1186/1556-276X-9-623. Epub 2014 Nov 21. PMID: 26089008; PMCID: PMC4494019.
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