Advanced Search
Display options
Filter resources
Text Availability
Article type
Publication date
Species
Language
Sex
Age
Showing 1381 to 1384 of 1384 entries
Sorted by: Best Match Show Resources per page
Beating Standard Quantum Limit with Weak Measurement.

Entropy (Basel, Switzerland)

Chen G, Yin P, Zhang WH, Li GC, Li CF, Guo GC.
PMID: 33809680
Entropy (Basel). 2021 Mar 16;23(3). doi: 10.3390/e23030354.

Weak measurements have been under intensive investigation in both experiment and theory. Numerous experiments have indicated that the amplified meter shift is produced by the post-selection, yielding an improved precision compared to conventional methods. However, this amplification effect comes...

Prognostic Value of an Immunohistochemical Signature in Patients With Head and Neck Mucosal Melanoma.

Frontiers in immunology

Xu QQ, Li QJ, Huang CL, Cai MY, Zhang MF, Yin SH, Lu LX, Chen L.
PMID: 34394109
Front Immunol. 2021 Jul 29;12:708293. doi: 10.3389/fimmu.2021.708293. eCollection 2021.

PURPOSE: We aimed to develop a prognostic immunohistochemistry (IHC) signature for patients with head and neck mucosal melanoma (MMHN).METHODS: In total, 190 patients with nonmetastatic MMHN with complete clinical and pathological data before treatment were included in our retrospective...

Public Psychosocial and Behavioral Responses in the First Wave of COVID-19 Pandemic: A Large Survey in China.

Frontiers in psychiatry

Yang H, Xian X, Hu J, Millis JM, Zhao H, Lu X, Sang X, Zhong S, Zhang H, Yin P, Mao Y.
PMID: 34393844
Front Psychiatry. 2021 Jul 28;12:676914. doi: 10.3389/fpsyt.2021.676914. eCollection 2021.

No abstract available.

Three-dimensional nanolithography guided by DNA modular epitaxy.

Nature materials

Shen J, Sun W, Liu D, Schaus T, Yin P.
PMID: 33846583
Nat Mater. 2021 May;20(5):683-690. doi: 10.1038/s41563-021-00930-7. Epub 2021 Apr 12.

Lithographic scaling of periodic three-dimensional patterns is critical for advancing scalable nanomanufacturing. Current state-of-the-art quadruple patterning or extreme-ultraviolet lithography produce a line pitch down to around 30 nm, which might be further scaled to sub-20 nm through complex post-fabrication...

Showing 1381 to 1384 of 1384 entries