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Banga D, Jarayaju N, Sheridan L, et al. Electrodeposition of CuInSe2 (CIS) via electrochemical atomic layer deposition (E-ALD). Langmuir. 2012;28(5):3024-31doi: 10.1021/la203574y.
Banga, D., Jarayaju, N., Sheridan, L., Kim, Y. G., Perdue, B., Zhang, X., Zhang, Q., & Stickney, J. (2012). Electrodeposition of CuInSe2 (CIS) via electrochemical atomic layer deposition (E-ALD). Langmuir : the ACS journal of surfaces and colloids, 28(5), 3024-31. https://doi.org/10.1021/la203574y
Banga, Dhego, et al. "Electrodeposition of CuInSe2 (CIS) via electrochemical atomic layer deposition (E-ALD)." Langmuir : the ACS journal of surfaces and colloids vol. 28,5 (2012): 3024-31. doi: https://doi.org/10.1021/la203574y
Banga D, Jarayaju N, Sheridan L, Kim YG, Perdue B, Zhang X, Zhang Q, Stickney J. Electrodeposition of CuInSe2 (CIS) via electrochemical atomic layer deposition (E-ALD). Langmuir. 2012 Feb 07;28(5):3024-31. doi: 10.1021/la203574y. Epub 2012 Jan 20. PMID: 22211357.
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