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Im DH, Kong-Soo Lee, Kang Y, et al. Interfacial Layer Control by Dry Cleaning Technology for Polycrystalline and Single Crystalline Silicon Growth. J Nanosci Nanotechnol. 2016;16(5):4906-13doi: 10.1166/jnn.2016.12255.
Im, D. H., Kong-Soo Lee, Kang, Y., Jeong, M., Park, K. W., Lee, S. G., Ma, J. W., Kim, Y., Kim, B., Im, K. V., Lim, H., & Lee, J. Y. (2016). Interfacial Layer Control by Dry Cleaning Technology for Polycrystalline and Single Crystalline Silicon Growth. Journal of nanoscience and nanotechnology, 16(5), 4906-13. https://doi.org/10.1166/jnn.2016.12255
Im, Dong-Hyun, et al. "Interfacial Layer Control by Dry Cleaning Technology for Polycrystalline and Single Crystalline Silicon Growth." Journal of nanoscience and nanotechnology vol. 16,5 (2016): 4906-13. doi: https://doi.org/10.1166/jnn.2016.12255
Im DH, Kong-Soo Lee, Kang Y, Jeong M, Park KW, Lee SG, Ma JW, Kim Y, Kim B, Im KV, Lim H, Lee JY. Interfacial Layer Control by Dry Cleaning Technology for Polycrystalline and Single Crystalline Silicon Growth. J Nanosci Nanotechnol. 2016 May;16(5):4906-13. doi: 10.1166/jnn.2016.12255. PMID: 27483844.
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