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A MICROPHOTOGRAPHIC CAMERA.

Science (New York, N.Y.)

Goosmann C.
PMID: 17754420
Science. 1940 Nov 15;92(2394):464. doi: 10.1126/science.92.2394.464.

No abstract available.

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Goosmann C. A MICROPHOTOGRAPHIC CAMERA. Science. 1940;92(2394):464doi: 10.1126/science.92.2394.464.
Goosmann, C. (1940). A MICROPHOTOGRAPHIC CAMERA. Science (New York, N.Y.), 92(2394), 464. https://doi.org/10.1126/science.92.2394.464
Goosmann, C. "A MICROPHOTOGRAPHIC CAMERA." Science (New York, N.Y.) vol. 92,2394 (1940): 464. doi: https://doi.org/10.1126/science.92.2394.464
Goosmann C. A MICROPHOTOGRAPHIC CAMERA. Science. 1940 Nov 15;92(2394):464. doi: 10.1126/science.92.2394.464. PMID: 17754420.
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Atomistic wear in a single asperity sliding contact.

Physical review letters

Gotsmann B, Lantz MA.
PMID: 18851384
Phys Rev Lett. 2008 Sep 19;101(12):125501. doi: 10.1103/PhysRevLett.101.125501. Epub 2008 Sep 16.

Abrasive wear of sharp silicon tips sliding distances of up to 750 m on a polymeric surface is studied using atomic force microscopy. The data cannot be explained by conventional macroscopic wear models. We present a new model in...

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Gotsmann B, Lantz MA. Atomistic wear in a single asperity sliding contact. Phys Rev Lett. 2008;101(12):125501doi: 10.1103/PhysRevLett.101.125501.
Gotsmann, B., & Lantz, M. A. (2008). Atomistic wear in a single asperity sliding contact. Physical review letters, 101(12), 125501. https://doi.org/10.1103/PhysRevLett.101.125501
Gotsmann, Bernd, and Lantz, Mark A. "Atomistic wear in a single asperity sliding contact." Physical review letters vol. 101,12 (2008): 125501. doi: https://doi.org/10.1103/PhysRevLett.101.125501
Gotsmann B, Lantz MA. Atomistic wear in a single asperity sliding contact. Phys Rev Lett. 2008 Sep 19;101(12):125501. doi: 10.1103/PhysRevLett.101.125501. Epub 2008 Sep 16. PMID: 18851384.
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Probe based surface modification of polymers below 30 nm pitch.

Journal of nanoscience and nanotechnology

Knoll A, Wiesmann D, Pires D, Gotsmann B, Dürig U.
PMID: 21128454
J Nanosci Nanotechnol. 2010 Jul;10(7):4538-42. doi: 10.1166/jnn.2010.2367.

Heated probes are used to modify the surface of polymeric thin films by thermomechanical indentation and local evaporation of material. The resolution of the processes is discussed for probe-storage and surface patterning-applications. As storage densities exceed 1 Tbit/in2, the...

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Knoll A, Wiesmann D, Pires D, et al. Probe based surface modification of polymers below 30 nm pitch. J Nanosci Nanotechnol. 2010;10(7):4538-42doi: 10.1166/jnn.2010.2367.
Knoll, A., Wiesmann, D., Pires, D., Gotsmann, B., & Dürig, U. (2010). Probe based surface modification of polymers below 30 nm pitch. Journal of nanoscience and nanotechnology, 10(7), 4538-42. https://doi.org/10.1166/jnn.2010.2367
Knoll, A, et al. "Probe based surface modification of polymers below 30 nm pitch." Journal of nanoscience and nanotechnology vol. 10,7 (2010): 4538-42. doi: https://doi.org/10.1166/jnn.2010.2367
Knoll A, Wiesmann D, Pires D, Gotsmann B, Dürig U. Probe based surface modification of polymers below 30 nm pitch. J Nanosci Nanotechnol. 2010 Jul;10(7):4538-42. doi: 10.1166/jnn.2010.2367. PMID: 21128454.
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Assessing the psychometric properties and the perceived usefulness of the BasisRaadsOnderzoek (BARO) as a first-line screening instrument for juvenile offenders.

Child and adolescent psychiatry and mental health

Doreleijers TA, Boonmann C, van Loosbroek E, Vermeiren RR.
PMID: 21714910
Child Adolesc Psychiatry Ment Health. 2011 Jun 29;5:24. doi: 10.1186/1753-2000-5-24.

BACKGROUND: The aim of this study is to investigate the psychometric properties and the perceived usefulness of the BARO (Dutch: BAsisRaadsOnderzoek; Protection Board Preliminary Examination of Juvenile Suspects). The BARO is a first-line screening instrument for the identification of...

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Doreleijers TA, Boonmann C, van Loosbroek E, et al. Assessing the psychometric properties and the perceived usefulness of the BasisRaadsOnderzoek (BARO) as a first-line screening instrument for juvenile offenders. Child Adolesc Psychiatry Ment Health. 2011;5:24doi: 10.1186/1753-2000-5-24.
Doreleijers, T. A., Boonmann, C., van Loosbroek, E., & Vermeiren, R. R. (2011). Assessing the psychometric properties and the perceived usefulness of the BasisRaadsOnderzoek (BARO) as a first-line screening instrument for juvenile offenders. Child and adolescent psychiatry and mental health, 524. https://doi.org/10.1186/1753-2000-5-24
Doreleijers, Theo Ah, et al. "Assessing the psychometric properties and the perceived usefulness of the BasisRaadsOnderzoek (BARO) as a first-line screening instrument for juvenile offenders." Child and adolescent psychiatry and mental health vol. 5 (2011): 24. doi: https://doi.org/10.1186/1753-2000-5-24
Doreleijers TA, Boonmann C, van Loosbroek E, Vermeiren RR. Assessing the psychometric properties and the perceived usefulness of the BasisRaadsOnderzoek (BARO) as a first-line screening instrument for juvenile offenders. Child Adolesc Psychiatry Ment Health. 2011 Jun 29;5:24. doi: 10.1186/1753-2000-5-24. PMID: 21714910; PMCID: PMC3149577.
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Trace2PS and FSA2PS: two software toolkits for converting trace and fsa files to PostScript format.

Source code for biology and medicine

Krawczyk J, Goesmann A, Nolte R, Werber M, Weisshaar B.
PMID: 19622158
Source Code Biol Med. 2009 Jul 21;4:4. doi: 10.1186/1751-0473-4-4.

BACKGROUND: Due to the advanced techniques in sequencing and fragment analysis, DNA sequencers and analyzers produce vast amounts of data within short time. To administrate the large data volume conveniently, efficient data management systems are used in order to...

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Krawczyk J, Goesmann A, Nolte R, et al. Trace2PS and FSA2PS: two software toolkits for converting trace and fsa files to PostScript format. Source Code Biol Med. 2009;4:4doi: 10.1186/1751-0473-4-4.
Krawczyk, J., Goesmann, A., Nolte, R., Werber, M., & Weisshaar, B. (2009). Trace2PS and FSA2PS: two software toolkits for converting trace and fsa files to PostScript format. Source code for biology and medicine, 44. https://doi.org/10.1186/1751-0473-4-4
Krawczyk, Justina, et al. "Trace2PS and FSA2PS: two software toolkits for converting trace and fsa files to PostScript format." Source code for biology and medicine vol. 4 (2009): 4. doi: https://doi.org/10.1186/1751-0473-4-4
Krawczyk J, Goesmann A, Nolte R, Werber M, Weisshaar B. Trace2PS and FSA2PS: two software toolkits for converting trace and fsa files to PostScript format. Source Code Biol Med. 2009 Jul 21;4:4. doi: 10.1186/1751-0473-4-4. PMID: 19622158; PMCID: PMC2722627.
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Nanoscale frictional dissipation into shear-stressed polymer relaxations.

Physical review letters

Jansen L, Schirmeisen A, Hedrick JL, Lantz MA, Knoll A, Cannara R, Gotsmann B.
PMID: 19658951
Phys Rev Lett. 2009 Jun 12;102(23):236101. doi: 10.1103/PhysRevLett.102.236101. Epub 2009 Jun 09.

Sliding friction between a silicon tip and a highly cross-linked polyaryletherketone film is studied using friction force microscopy. The friction force as a function of temperature between 150 and 500 K shows distinctive maxima corresponding to alpha and beta...

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Jansen L, Schirmeisen A, Hedrick JL, et al. Nanoscale frictional dissipation into shear-stressed polymer relaxations. Phys Rev Lett. 2009;102(23):236101doi: 10.1103/PhysRevLett.102.236101.
Jansen, L., Schirmeisen, A., Hedrick, J. L., Lantz, M. A., Knoll, A., Cannara, R., & Gotsmann, B. (2009). Nanoscale frictional dissipation into shear-stressed polymer relaxations. Physical review letters, 102(23), 236101. https://doi.org/10.1103/PhysRevLett.102.236101
Jansen, Lars, et al. "Nanoscale frictional dissipation into shear-stressed polymer relaxations." Physical review letters vol. 102,23 (2009): 236101. doi: https://doi.org/10.1103/PhysRevLett.102.236101
Jansen L, Schirmeisen A, Hedrick JL, Lantz MA, Knoll A, Cannara R, Gotsmann B. Nanoscale frictional dissipation into shear-stressed polymer relaxations. Phys Rev Lett. 2009 Jun 12;102(23):236101. doi: 10.1103/PhysRevLett.102.236101. Epub 2009 Jun 09. PMID: 19658951.
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GAS GANGRENE.

Annals of surgery

Goodman C.
PMID: 17865040
Ann Surg. 1924 Jun;79(6):806-12. doi: 10.1097/00000658-192406000-00002.

No abstract available.

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Goodman C. GAS GANGRENE. Ann Surg. 1924;79(6):806-12doi: 10.1097/00000658-192406000-00002.
Goodman, C. (1924). GAS GANGRENE. Annals of surgery, 79(6), 806-12. https://doi.org/10.1097/00000658-192406000-00002
Goodman, C. "GAS GANGRENE." Annals of surgery vol. 79,6 (1924): 806-12. doi: https://doi.org/10.1097/00000658-192406000-00002
Goodman C. GAS GANGRENE. Ann Surg. 1924 Jun;79(6):806-12. doi: 10.1097/00000658-192406000-00002. PMID: 17865040; PMCID: PMC1399651.
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ARTERIOVENOUS ANASTOMOSIS OF THE FEMORAL VESSELS FOR IMPENDING GANGRENE.

Annals of surgery

Goodman C.
PMID: 17863219
Ann Surg. 1914 Jul;60(1):62-87. doi: 10.1097/00000658-191407000-00008.

No abstract available.

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Goodman C. ARTERIOVENOUS ANASTOMOSIS OF THE FEMORAL VESSELS FOR IMPENDING GANGRENE. Ann Surg. 1914;60(1):62-87doi: 10.1097/00000658-191407000-00008.
Goodman, C. (1914). ARTERIOVENOUS ANASTOMOSIS OF THE FEMORAL VESSELS FOR IMPENDING GANGRENE. Annals of surgery, 60(1), 62-87. https://doi.org/10.1097/00000658-191407000-00008
Goodman, C. "ARTERIOVENOUS ANASTOMOSIS OF THE FEMORAL VESSELS FOR IMPENDING GANGRENE." Annals of surgery vol. 60,1 (1914): 62-87. doi: https://doi.org/10.1097/00000658-191407000-00008
Goodman C. ARTERIOVENOUS ANASTOMOSIS OF THE FEMORAL VESSELS FOR IMPENDING GANGRENE. Ann Surg. 1914 Jul;60(1):62-87. doi: 10.1097/00000658-191407000-00008. PMID: 17863219; PMCID: PMC1406387.
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Nanoscale three-dimensional patterning of molecular resists by scanning probes.

Science (New York, N.Y.)

Pires D, Hedrick JL, De Silva A, Frommer J, Gotsmann B, Wolf H, Despont M, Duerig U, Knoll AW.
PMID: 20413457
Science. 2010 May 07;328(5979):732-5. doi: 10.1126/science.1187851. Epub 2010 Apr 22.

For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method...

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Pires D, Hedrick JL, De Silva A, et al. Nanoscale three-dimensional patterning of molecular resists by scanning probes. Science. 2010;328(5979):732-5doi: 10.1126/science.1187851.
Pires, D., Hedrick, J. L., De Silva, A., Frommer, J., Gotsmann, B., Wolf, H., Despont, M., Duerig, U., & Knoll, A. W. (2010). Nanoscale three-dimensional patterning of molecular resists by scanning probes. Science (New York, N.Y.), 328(5979), 732-5. https://doi.org/10.1126/science.1187851
Pires, David, et al. "Nanoscale three-dimensional patterning of molecular resists by scanning probes." Science (New York, N.Y.) vol. 328,5979 (2010): 732-5. doi: https://doi.org/10.1126/science.1187851
Pires D, Hedrick JL, De Silva A, Frommer J, Gotsmann B, Wolf H, Despont M, Duerig U, Knoll AW. Nanoscale three-dimensional patterning of molecular resists by scanning probes. Science. 2010 May 07;328(5979):732-5. doi: 10.1126/science.1187851. Epub 2010 Apr 22. PMID: 20413457.
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Relaxation kinetics of nanoscale indents in a polymer glass.

Physical review letters

Knoll A, Wiesmann D, Gotsmann B, Duerig U.
PMID: 19392238
Phys Rev Lett. 2009 Mar 20;102(11):117801. doi: 10.1103/PhysRevLett.102.117801. Epub 2009 Mar 17.

Nanometer scale indents have been written in a cross-linked polystyrene sample, and their relaxation has been studied at annealing temperatures well below the glass transition of the polymer. The indents represent a highly nonequilibrium state of the polymer which...

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Knoll A, Wiesmann D, Gotsmann B, et al. Relaxation kinetics of nanoscale indents in a polymer glass. Phys Rev Lett. 2009;102(11):117801doi: 10.1103/PhysRevLett.102.117801.
Knoll, A., Wiesmann, D., Gotsmann, B., & Duerig, U. (2009). Relaxation kinetics of nanoscale indents in a polymer glass. Physical review letters, 102(11), 117801. https://doi.org/10.1103/PhysRevLett.102.117801
Knoll, A, et al. "Relaxation kinetics of nanoscale indents in a polymer glass." Physical review letters vol. 102,11 (2009): 117801. doi: https://doi.org/10.1103/PhysRevLett.102.117801
Knoll A, Wiesmann D, Gotsmann B, Duerig U. Relaxation kinetics of nanoscale indents in a polymer glass. Phys Rev Lett. 2009 Mar 20;102(11):117801. doi: 10.1103/PhysRevLett.102.117801. Epub 2009 Mar 17. PMID: 19392238.
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RADIOACTIVE STANDARDS.

Science (New York, N.Y.)

Curtiss LF, Goodman C, Kovarik AF, Lind SC, Piggot CS, Evans RD.
PMID: 17839405
Science. 1940 Mar 22;91(2360):294-5. doi: 10.1126/science.91.2360.294.

No abstract available.

Cite
Curtiss LF, Goodman C, Kovarik AF, et al. RADIOACTIVE STANDARDS. Science. 1940;91(2360):294-5doi: 10.1126/science.91.2360.294.
Curtiss, L. F., Goodman, C., Kovarik, A. F., Lind, S. C., Piggot, C. S., & Evans, R. D. (1940). RADIOACTIVE STANDARDS. Science (New York, N.Y.), 91(2360), 294-5. https://doi.org/10.1126/science.91.2360.294
Curtiss, L F, et al. "RADIOACTIVE STANDARDS." Science (New York, N.Y.) vol. 91,2360 (1940): 294-5. doi: https://doi.org/10.1126/science.91.2360.294
Curtiss LF, Goodman C, Kovarik AF, Lind SC, Piggot CS, Evans RD. RADIOACTIVE STANDARDS. Science. 1940 Mar 22;91(2360):294-5. doi: 10.1126/science.91.2360.294. PMID: 17839405.
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Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon.

Nature nanotechnology

Bhaskaran H, Gotsmann B, Sebastian A, Drechsler U, Lantz MA, Despont M, Jaroenapibal P, Carpick RW, Chen Y, Sridharan K.
PMID: 20118919
Nat Nanotechnol. 2010 Mar;5(3):181-5. doi: 10.1038/nnano.2010.3. Epub 2010 Jan 31.

Understanding friction and wear at the nanoscale is important for many applications that involve nanoscale components sliding on a surface, such as nanolithography, nanometrology and nanomanufacturing. Defects, cracks and other phenomena that influence material strength and wear at macroscopic...

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Bhaskaran H, Gotsmann B, Sebastian A, et al. Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon. Nat Nanotechnol. 2010;5(3):181-5doi: 10.1038/nnano.2010.3.
Bhaskaran, H., Gotsmann, B., Sebastian, A., Drechsler, U., Lantz, M. A., Despont, M., Jaroenapibal, P., Carpick, R. W., Chen, Y., & Sridharan, K. (2010). Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon. Nature nanotechnology, 5(3), 181-5. https://doi.org/10.1038/nnano.2010.3
Bhaskaran, Harish, et al. "Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon." Nature nanotechnology vol. 5,3 (2010): 181-5. doi: https://doi.org/10.1038/nnano.2010.3
Bhaskaran H, Gotsmann B, Sebastian A, Drechsler U, Lantz MA, Despont M, Jaroenapibal P, Carpick RW, Chen Y, Sridharan K. Ultralow nanoscale wear through atom-by-atom attrition in silicon-containing diamond-like carbon. Nat Nanotechnol. 2010 Mar;5(3):181-5. doi: 10.1038/nnano.2010.3. Epub 2010 Jan 31. PMID: 20118919.
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Showing 13 to 24 of 338 entries