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Mironov AE, Kim J, Huang Y, et al. Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors. Nanoscale. 2020;12(32):16796-16804doi: 10.1039/d0nr04142d.
Mironov, A. E., Kim, J., Huang, Y., Steinforth, A. W., Sievers, D. J., & Eden, J. G. (2020). Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors. Nanoscale, 12(32), 16796-16804. https://doi.org/10.1039/d0nr04142d
Mironov, Andrey E, et al. "Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors." Nanoscale vol. 12,32 (2020): 16796-16804. doi: https://doi.org/10.1039/d0nr04142d
Mironov AE, Kim J, Huang Y, Steinforth AW, Sievers DJ, Eden JG. Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors. Nanoscale. 2020 Aug 28;12(32):16796-16804. doi: 10.1039/d0nr04142d. Epub 2020 Aug 07. PMID: 32766620.
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