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Chiappim W, Testoni GE, Doria AC, et al. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology. 2016;27(30):305701doi: 10.1088/0957-4484/27/30/305701.
Chiappim, W., Testoni, G. E., Doria, A. C., Pessoa, R. S., Fraga, M. A., Galvão, N. K., Grigorov, K. G., Vieira, L., & Maciel, H. S. (2016). Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology, 27(30), 305701. https://doi.org/10.1088/0957-4484/27/30/305701
Chiappim, W, et al. "Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode." Nanotechnology vol. 27,30 (2016): 305701. doi: https://doi.org/10.1088/0957-4484/27/30/305701
Chiappim W, Testoni GE, Doria AC, Pessoa RS, Fraga MA, Galvão NK, Grigorov KG, Vieira L, Maciel HS. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology. 2016 Jul 29;27(30):305701. doi: 10.1088/0957-4484/27/30/305701. Epub 2016 Jun 15. PMID: 27302656.
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