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Bi K, Xiang Q, Chen Y, et al. Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications. Nanoscale. 2017;9(43):16755-16763doi: 10.1039/c7nr05779b.
Bi, K., Xiang, Q., Chen, Y., Shi, H., Li, Z., Lin, J., Zhang, Y., Wan, Q., Zhang, G., Qin, S., Zhang, X., & Duan, H. (2017). Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications. Nanoscale, 9(43), 16755-16763. https://doi.org/10.1039/c7nr05779b
Bi, Kaixi, et al. "Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications." Nanoscale vol. 9,43 (2017): 16755-16763. doi: https://doi.org/10.1039/c7nr05779b
Bi K, Xiang Q, Chen Y, Shi H, Li Z, Lin J, Zhang Y, Wan Q, Zhang G, Qin S, Zhang X, Duan H. Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications. Nanoscale. 2017 Nov 09;9(43):16755-16763. doi: 10.1039/c7nr05779b. PMID: 29072744.
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